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Formation and properties of In‐doped high‐conductivity CdSe evaporated film

机译:In‐掺杂高‐电导率CdSe蒸发膜的形成及性能

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High dark‐conductivity CdSe films have been prepared by coevaporation of CdSe and In, and the physical properties of the films were investigated. The dark conductivity of the films at 25 °C ranged from 0.68 to 3800 S cm−1. The conductivity type wasn‐type and In was found to act as the donor in CdSe films.The film structure was of hexagonal zinc sulfide type with a preferential orientation of the (002) planes parallel to the substrate. Analyzing the film structure in detail by x‐ray analysis, it was found that the In atoms were doped substitutionally into the CdSe during the low‐concentration doping stage and then doped interstitially during the high doping stage.
机译:通过CdSe和In的共蒸发制备了高暗电导率的CdSe薄膜,并研究了薄膜的物理性质。在25 °C时,薄膜的暗电导率范围为0.68至3800 S cm−1。电导率类型为&连字符类型,并且发现 In 在 CdSe 薄膜中充当供体。薄膜结构为六方硫化锌型,(002)平面平行于基体。通过X&连字符射线分析对薄膜结构进行详细分析,发现In原子在低&连字符&��杂阶段被取代掺杂到CdSe中,然后在高掺杂阶段被间隙掺杂。

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