We have used the technique of electrolyte electroreflectance (EER) coupled with electrochemical etching to profile through epitaxial layers and heterostructures of Hg1minus;xCdxTe. The need for proper electrochemical control during EER measurements is discussed. The resolution achieved in both composition, Dgr;x=plusmn;0.002, and etch depth, plusmn;30 Aring;, has made possible the observation of the variations in composition at the ambient/epilayer, epilayer/substrate, and highhyphen;x/lowhyphen;xinterfaces. Good correlations of the profiles observed have been obtained with secondary ion mass spectroscopy, electron dispersive xhyphen;ray diffraction, and Rutherford backscattering measurements. The variation of the broadening parameter Ggr; at these interfaces is also discussed.
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