The room temperature pulsed operation of In0.49Ga0.31Al0.20P/In0.49Ga0.51−xAlxP/In0.49Ga0.31Al0.20P(x=0.00–0.03) double heterostructure (DH) laser diodes have been achieved for the first time. The lasing wavelength was 0.66–0.68 mgr;m with a threshold current density of 2.6–3.6×104A/cm2at 26 °C. These results were achieved by growing DH wafers by molecular beam epitaxy (MBE). Key points in the successful MBE growth of these DH wafers were, first, the realization of low resistancep‐type andn‐type InGaAlP layers by reducing contamination in the growth chamber. This was done by installing a substrate loading room with an interlock valve and a substrate transfer mechanism. The second was the realization of an abruptp‐njunction by the use of Si instead of Sn as ann‐type dopant.
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机译:首次实现了In0.49Ga0.31Al0.20P/In0.49Ga0.51−xAlxP/In0.49Ga0.31Al0.20P(x=0.00–0.03)双异质结构(DH)激光二极管的室温脉冲工作.激光波长为0.66–0.68 &mgr;m,阈值电流密度为2.6–3.6×104A/cm2,26 °C。 这些结果是通过分子束外延(MBE)生长DH晶圆来实现的。这些DH晶圆成功生长MBE的关键点是,首先,通过减少生长室中的污染,实现了低电阻p‐type和n‐type InGaAlP层。这是通过安装带有联锁阀和基板传输机构的基板装载室来完成的。第二种是通过使用 Si 而不是 Sn 作为 ann‐型掺杂剂来实现突然的 abruptp‐njunction。
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