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Crystal structure and magnetic softness of Fe‐Si polycrystalline films

机译:Fe‐Si多晶薄膜的晶体结构及磁软性

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摘要

Magnetic softness of polycrystalline Fe‐based alloy films is investigated. From calculation of magnetocrystalline anisotropy and magnetostriction assuming the magnetization is confined in a certain crystal plane of bcc Fe or Fe‐Si alloy, Fe alloy films with (111) orientation parallel to the film plane are expected to have good magnetic softness. Fe‐6.9 wt.  Si polycrystalline films with various crystallographic orientations such as (100), (110), or (111) oriented parallel to the film plane plane are deposited on underlayers such as MgO, ZnO, and ZnSe by a high‐rate sputtering system. Fe‐Si films on ZnSe underlayers with (111) orientation exhibit smallerHcand better thermal stability than those of films with other orientations. Magnetic softness and thermal stability are improved for the double‐layered films with those orientations. For multilayered Fe‐6.9 wt.  Si films on ZnSe underlayers, theHcof deposited films is about 0.5 Oe, and is stable against annealing up to 500 °C.
机译:研究了多晶Fe&连字符基合金薄膜的磁软性.根据磁晶各向异性和磁致伸缩的计算,假设磁化强度被限制在bcc Fe或Fe‐Si合金的一定晶面内,预计(111)取向平行于薄膜面的Fe合金薄膜具有良好的磁软性。Fe‐6.9 wt. % 具有不同晶体取向(100)、(110)或(111)平行于薄膜平面的硅多晶薄膜通过高连字符速率溅射系统沉积在MgO、ZnO和ZnSe等底层上。与具有(111)取向的ZnSe底层相比,具有(111)取向的ZnSe底层上的Fe‐Si薄膜表现出更小的Hc和更好的热稳定性。具有这些取向的双层层薄膜的磁软性和热稳定性得到改善。对于ZnSe底层上的多层Fe‐6.9 wt.%Si薄膜,Hcof沉积薄膜约为0.5 Oe,并且在高达500 °C的温度下对退火保持稳定。

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  • 来源
    《journal of applied physics》 |1990年第11期|6981-6990|共页
  • 作者

    Akihiko Hosono; Yutaka Shimada;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
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