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Epitaxial NaCl structure δ-TaN_(x)(001): Electronic transport properties, elastic modulus, and hardness versus N/Ta ratio

机译:外延 NaCl 结构 δ-TaN_(x)(001):电子输运特性、弹性模量和硬度与 N/Ta 的比值

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摘要

While metastable Bl-NaCl-structure δ-TaN_(x) is presently used in a variety of hard coating, wear-resistant, and diffusion barrier applications, it is a complex material exhibiting a wide single-phase field, xapprox-0.94-1.37, and little is known about its fundamental properties. Here, we report physical properties of epitaxial δ-TaN_(x) layers grown as a function of x on MgO(001) by ultrahigh vacuum reactive magnetron sputter deposition. The room-temperature resistivity (ρ=225 μΩ cm), hardness (H=30.9 GPa), and elastic modulus (E=455 GPa) of δ-TaN_(x)(001) are independent of x over the range 0.94-1.22. However, changes in the electronic structure associated with increasing x>1.22 lead to an increase in ρ with a decrease in H and E. All δ-TaN_(x)(001) layers exhibit negative temperature coefficients of resistivity between 20 and 400 K due to weak carrier localization. δ-TaN_(x) is superconducting with the highest critical temperature, 8.45 K, obtained for layers with the lowest N/Ta ratio, x=0.94. Based upon the above results, combined with the fact that the relaxed lattice constant a_(0) shows only a very weak dependence on x, we propose that the wide phase field in δ-TaN_(x) is due primarily to antisite substitutions of Ta on N (and N on Ta) sites, rather than to cation and anion vacancies. To first order, antisite substitutions in TaN_(x) are isoelectronic and hence have little effect on charge carrier density. At sufficiently high N/Ta ratios, however, simple electron-counting arguments are no longer valid since large deviations from stoichiometry alter the character of the band structure itself.
机译:虽然亚稳态 Bl-NaCl 结构 δ-TaN_(x) 目前用于各种硬涂层、耐磨和扩散屏障应用,但它是一种复杂的材料,具有广泛的单相场 xapprox-0.94-1.37,对其基本特性知之甚少。在这里,我们报告了通过超高真空反应磁控溅射沉积在MgO(001)上作为x函数生长的外延δ-TaN_(x)层的物理性质。δ-TaN_(x)(001) 的室温电阻率 (ρ=225 μΩ cm)、硬度 (H=30.9 GPa) 和弹性模量 (E=455 GPa) 在 0.94-1.22 范围内与 x 无关。然而,随着 x>1.22 的增加,电子结构的变化导致 ρ 的增加而 H 和 E 的减少。由于载流子定位较弱,所有 δ-TaN_(x)(001) 层都表现出 20 至 400 K 之间的负电阻率温度系数。δ-TaN_(x)是超导的,最高临界温度为8.45 K,对于N/Ta比最低的层,x=0.94。基于上述结果,结合松弛晶格常数a_(0)仅显示出对x的非常弱的依赖性,我们提出δ-TaN_(x)中的宽相场主要是由于N位点上Ta(和Ta上N)位点的反位点取代,而不是阳离子和阴离子空位。一阶,TaN_(x)中的反位点取代是等电子的,因此对电荷载流子密度影响不大。然而,在足够高的 N/Ta 比下,简单的电子计数参数不再有效,因为与化学计量学的巨大偏差会改变能带结构本身的特征。

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