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Cross correlation of optical properties of thin films under thermal radiation

机译:热辐射下薄膜光学特性的相互关联

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摘要

Optical property and temperature distributions of a multilayer thin‐ (∼1 mgr;m) film structure exposed to thermal radiation (1 mgr;m≤lgr;≤8 mgr;m) are dependent on film thicknesses, geometry, and material properties. Film thickness variation, simulated numerically, resulted in local minima and maxima in reflectivity and temperature distribution of these structures. We attribute this to a cross correlation phenomenon that occurs when the optical thickness of any two films in the structure is equal over a broad radiation spectrum.
机译:暴露于热辐射 (1 &mgr;m) 的多层薄膜结构的光学特性和温度分布 (∼1 &mgr;m≤&lgr;≤8 &mgr;m) 取决于薄膜厚度、几何形状和材料特性。通过数值模拟,薄膜厚度变化导致这些结构的反射率和温度分布的局部最小值和最大值。我们将其归因于一种互相关现象,当结构中任意两层薄膜的光学厚度在宽辐射光谱上相等时,就会发生这种现象。

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