Mixtures of Xe and Cl2have been irradiated at 193 nm with a pulsed ArF laser. The collisionhyphen;assisted laserhyphen;induced absorption results in emission of XeCl (BandC) at 308 and 340 nm, respectively. The intensity of XeCl emission is found to vary linearly with ArF laser power, indicating the occurrence of a single photonhyphen;assisted collisionhyphen;induced process. The temporal characteristics of the emission vary substantially with the number density of each reagent showing fast formation and decay rates at high densities, but slower rates at lower densities. A kinetic mechanism is proposed in which a (XeCl2) transient complex is initially formed and that complex subsequently dissociates to yield XeCl.
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