首页> 外文期刊>journal of applied physics >Reduction in dislocation density in In‐doped GaP LPE layers grown from indium solvent
【24h】

Reduction in dislocation density in In‐doped GaP LPE layers grown from indium solvent

机译:降低由铟溶剂生长的In‐掺杂GaP LPE层的位错密度

获取原文
获取外文期刊封面目录资料

摘要

A reduction in dislocation density, typically by a factor of 3–8, was observed across the interface between LEC GaP (111)B substrate and ann‐type In‐doped GaP layer grown from indium solvent by liquid‐phase epitaxy. Doping of the epitaxial layer with indium contributed to the reduction in dislocation density in the epitaxial layer.
机译:在LEC GaP(111)B衬底和通过液相外延从铟溶剂中生长的安&连字符型In‐掺杂GaP层之间的界面上观察到位错密度降低,通常降低3-8倍。外延层掺杂铟有助于降低外延层的位错密度。

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号