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Thermal diffusion in the gas mixture CH4ndash;Ar

机译:Thermal diffusion in the gas mixture CH4ndash;Ar

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The temperature dependence of the thermal diffusion factor agr;Tfor the CH4ndash;Ar system has been studied by a twohyphen;bulb method in the temperature range 300ndash;1100thinsp;deg;K. The plots of agr;Tvs the temperature show a normal behavior with a gradual increase of agr;Twith temperature. The composition dependence of agr;Thas also been studied for this system, the measurements covering the composition range 10percnt;ndash;90percnt;CH4. The agr;Tvs composition of CH4curves show a minimum at all temperatures, which are more clearly defined at high temperatures. Analysis of the gas mixtures was carried out by means of the wellhyphen;known Katharometer technique.

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