Magnetic susceptibility and microstructure of hydrogenated amorphous silicon measured by nuclear magnetic resonance on a single thin film

摘要

A nuclear magnetic resonance technique for precisely measuring the bulk magnetic susceptibility of micron-thick hydrogenated amorphous silicon (a-Si:H) film is introduced. The large disorder-induced diamagnetic enhancement exhibited by a-Si:H is shown to provide a sensitive bulk measurement for detecting variations in structural order in a-Si:H films. Furthermore, this approach is shown to be effective in revealing the details of microstructure in a-Si:H, including the presence of microstructural anisotropy.