Mixed thin films of TiO2and SiO2were produced by coevaporation from separate electronhyphen;beam sources and simultaneous bombardment of the growing film with oxygen ions. The optical properties of the films were determined during growth byinsituellipsometry and the surface composition of the deposited films studied byinsituion scattering spectroscopy,exsituxhyphen;ray photoelectron spectroscopy, and energy filtered electron diffraction. The correlation between the optical and surface characterization is presented. There is evidence of local variations in the relative concentrations of TiO2and SiO2. The position of the Si 2pbinding energy depends on the TiO2content in the film, indicating the possible formation of an intimate mixture.
展开▼