Rapid thermal annealing of YBaCuO thin films deposited on SiO2substrates

摘要

Ag/Cu/BaO/Y2O3/Ag layered structures have been formed using electronhyphen;beam evaporation on SiO2substrates, and posthyphen;annealed by rapid thermal annealing at different temperatures. After a 960thinsp;deg;C 15hyphen;s anneal, the film showed a superconducting onset temperature of 93 K and a zero resistance at 79 K. With a lowerhyphen;temperature anneal, the film exhibited metallic behavior. On the other hand, for a higherhyphen;temperature anneal, silicon was found to diffuse into the film as observed by Auger depth profiling. The Si outhyphen;diffusion degraded the superconducting properties of the film.