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Negative differential conductivity in electron‐beam irradiated Ar‐HCl mixtures

机译:电子连字符;束辐照 Ar‐HCl 混合物中的负微分电导率

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摘要

The drift velocity of secondary electrons in electron‐beam irradiated Ar/HCl gas mixtures was obtained by measuring both the current and electron densities as a function of an externally applied electric field. The measurements were performed for a variety of HCl concentrations between 0.1 and 5.0 and electric‐field strengths between 0.1 and 10 Td (1 Td=10−17V cm2). The electron‐beam pulse was 350 ns long, at an energy of 150 keV and current density between 4.2 and 0.017 A/cm2. The electron density was measured by time‐resolved infrared interferometry at 9.6 mgr;m. The results show that the Ar/HCl system exhibits negative differential conductivity.
机译:通过测量电流和电子密度作为外部外加电场的函数,获得了电子&连字符束辐照的Ar/HCl气体混合物中二次电子的漂移速度。测量对象为0.1°Cnt;至5.0°Cnt;和0.1°C-10°C.之间的各种HCl浓度和0.1至10 Td(1 Td=10−17V cm2)之间的电场强度。电子束脉冲长度为350 ns,能量为150 keV,电流密度在4.2至0.017 A/cm2之间。电子密度在9.6 &mgr;m处通过时间分辨红外干涉测量法测量。结果表明,Ar/HCl体系表现出负的差分电导率。

著录项

  • 来源
    《journal of applied physics》 |1987年第4期|1667-1669|共页
  • 作者

    M. Lando; Z. Rozenberg; M. Rokni;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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