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Mobility of tungsten clusters and microstructure of tungsten films on amorphous carbon substrates

机译:钨团簇的迁移率和钨膜在非晶态碳衬底上的微观结构

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The cluster density, size and spatial distribution of tungsten clusters during deposition onto amorphous carbon (a-C) substrates at a deposition rate of 0.005 nm s-1are investigated. The effect of interparticle forces in producing preferred spacings between clusters and the influence of such forces on coalescence are determined. It is shown that the distribution of tungsten clusters on a-C is non-random and the mobility of tungsten clusters decreases with increasing size. A minimum centre-to-centre spacing value is observed. Venables' correlation function of 1973 and Schmeisser's modification to Venables' correlation function proposed in 1974 are applied to the experimental results. Venables' correlation function predicts the nearest-neighbour distance distribution consistently for deposits with cluster number density less than 3.0*1012cm-2while Schmeisser's modified correlation function does not produce a good fit to the data. The microstructure of tungsten films of varying thickness for a deposition rate of 0.25 nm s-1is also studied by electron microscopy and electron diffraction.
机译:研究了钨团簇在0.005 nm s-1沉积速率下沉积到非晶碳(a-C)衬底上的密度、尺寸和空间分布.确定了粒子间力在团簇之间产生优选间距的影响以及这种力对聚结的影响。结果表明,钨团簇在a-C上的分布是非随机的,钨团簇的迁移率随尺寸的增加而降低。观察到中心到中心的最小间距值。将1973年的Venables相关函数和1974年提出的Schmeisser对Venables相关函数的修正应用于实验结果。对于簇数密度小于3.0*1012cm-2的矿床,Venables的相关函数可以一致地预测最近邻距离分布,而Schmeisser修正的相关函数不能很好地拟合数据。通过电子显微镜和电子衍射研究了沉积速率为0.25 nm s-1时不同厚度钨薄膜的微观结构.

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