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POINT-CONTACT MEASUREMENTS FOR HIGH-RESOLUTION PROFILING OF HIGH-RESISTIVITY ILL-V SEMICONDUCTORS

机译:POINT-CONTACT MEASUREMENTS FOR HIGH-RESOLUTION PROFILING OF HIGH-RESISTIVITY ILL-V SEMICONDUCTORS

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摘要

A point-contact technique operating at low forward bias was used for high-resolution profiling of semi-insulating GaAs and InP as well as of medium-resistivity undoped n-type GaAs. Electrical mesoscopic non-uniformities strongly correlated to the cellular structure of dislocations could be detected in LEC GaAs and VGF GaAs. Between the profiles of the point-contact current and of the band-band photoluminescence intensity a close correlation was observed on nearly all LEC GaAs samples and on InP. In the case of VGF GaAs, on the contrary, an anticorrelation exists. References: 15

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