Optical lithography below 100nm

摘要

Optical lithography has been the primary patterning technology for IC production for 30 years. Momentum and astounding improvements in resists and optics have forestalled the introduction of more complex alternatives. How much longer is thislikely to continue? Various improvement paths with alternate lens and system tradeoffs indicate that there is still headroom left, and that the end of optical lithography is below 100 nm -- probably close to 70-80 nm.