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Interaction of H(D) atoms with surfaces of glassy carbon:adsorption,adstration,and etching

机译:H(D)原子与玻状碳表面的相互作用:吸附、粘附和刻蚀

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摘要

The interaction of thermal (2000K)H and D withglassy carbon (GC) surfaces wasinvestigated in ultrahigh vacuum environmental using thermal desorption and reaction an d reaction kinetics mass spectroscopy.Virgin GC surfaces(not previously subjected to stationary etching by H atoms) exhibit a remarkably low reactivity withrespect to adsorption of D.The saturaton coverage of D on GC is about a factor of ten smaller than on (0001) graphite surfaces (HOPG or natura signle crystal).Thermal desorption spectra indicate that D atoms on virgin GC surfaces are adsorbed on distorted graphite basal planes,i.e.the recombinative desorption features of D onGC between 400 and 600 K are broadened as compare dt those measured on graphite.Upon heating of D-covered efficient aroudn 600 K,as was previously observed on other carbon materials,a-C:H thin films and graphite,and as expected from the etching mechanism on C substrtes.GC surfaces repeatedly etched by H exhibit an increasing density of C atoms located at edge sites which are capable to adsorb D via formation of Sp~n C-D bonds.D from these sites desorbs recombinatively around 830 K and competitive desorption of C_2 by H exhibitsthe same phenomenology as on graphite:Eley-Rideal mechanism and large abstraction cross-section at small D coverages.
机译:采用热解吸和反应动力学质谱研究了热(2000K)H和D与玻璃碳(GC)表面在超高真空环境下的相互作用.原始GC表面(以前未受到H原子的固定蚀刻)在D的吸附方面表现出非常低的反应性.D在GC上的饱和子覆盖率比(0001)石墨表面(HOPG或natura signle晶体)小约十倍。热解吸光谱表明,原始GC表面上的D原子被吸附在扭曲的石墨基面上,即D onGC在400-600 K之间的重组解吸特性与石墨上测得的解吸特性相比有所拓宽。在加热D覆盖的高效600 K时,正如之前在其他碳材料,a-C:H薄膜和石墨上观察到的那样,并且正如C基层上的蚀刻机理所预期的那样。被H反复蚀刻的GC表面表现出位于边缘位点的C原子密度增加,这些C原子能够通过形成Sp~n C-D键来吸附D。来自这些位点的 D 在 830 K 左右重新解吸,H 对C_2的竞争性解吸表现出与石墨相同的现象学:Eley-Rideal 机制和小 D 覆盖率下的大提取截面。

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