New xhyphen;ray source for lithography

摘要

We propose the use of electromagnetic waves as an undulator in order to generate x rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasihyphen;optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x rays of the desired energy. The scaling of the xhyphen;ray power with wavelength indicates that the throughput can be increased by using resists which are sensitive to shorter wavelength x rays.