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首页> 外文期刊>journal of applied physics >Addendum: lsquo;lsquo;Carrier concentration and activation energy in heavily donorhyphen;doped siliconrsquo;rsquo; lsqb;J. Appl. Phys.61, 591 (1987 )rsqb;
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Addendum: lsquo;lsquo;Carrier concentration and activation energy in heavily donorhyphen;doped siliconrsquo;rsquo; lsqb;J. Appl. Phys.61, 591 (1987 )rsqb;

机译:Addendum: lsquo;lsquo;Carrier concentration and activation energy in heavily donorhyphen;doped siliconrsquo;rsquo; lsqb;J. Appl. Phys.61, 591 (1987 )rsqb;

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摘要

In a previous paper lsqb;D. Schechter, J. Appl. Phys.61, 591 (1987)rsqb; the Leendash;McGill model for computing the populations and carrier concentrations in heavily dopednhyphen;type silicon was systematically explored. In this addendum, the carrier concentration calculated using the Leendash;McGill model is calculated as the doping density is decreased, and is compared with that calculated using the usual dilute doping model. In particular, the extent to which the predictions of the two models agree is explored. It is found that at room temperature the two models agree very closely for doping concentrations below 1times;1017cmminus;3, but at reduced temperatures the coincidence is not so close.

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  • 来源
    《journal of applied physics 》 |1988年第4期| 1250-1251| 共页
  • 作者

    Daniel Schechter;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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