Photosensitization of DNA by dipicolinic acid,a major component of spores of Bacillus species

摘要

The DNA in spores of Bacillus species exhibits a relatively novel photochemistry,as 5-thyminyl-5,6-dihydrothymine (spore photoproduct (SP)) is by far the major UV photoproduct whereas cyclobutane dimers (CPDs) and (6-4) photoproducts (6-4PPs) are the major photoproducts in growing cells.Dehydration and more importantly complexation of DNA by alpha/beta-type small,acid-soluble spore proteins (SASP) have been shown to partly explain the photochemistry of spore DNA.The large amount (approx10 of dry weight) of the spore's dipicolinic acid (DPA) also has been shown to play a role in spore DNA photochemistry.In the present work we showed by exposing spores of various strains of B.subtilis to UVC radiation that DPA photosensitizes spore DNA to damage and favors the formation of SP.The same result was obtained in either the presence or absence of the alpha/beta-type SASP that saturate the spore chromosome.Addition of DPA to dry films of isolated DNA or to frozen solutions of thymidine also led to a higher yield of SP and increased ratio of CPDs to 6-4PPs;DPA also significantly increased the yield of CPDs in thymidine exposed to UVC in liquid solution.These observations strongly support a triplet energy transfer between excited DPA and thymine residues.We further conclude that the combined effects of alpha/beta-type SASP and DPA explain the novel photochemistry of DNA in spores of Bacillus species.