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外文期刊>Journal of Materials Science Letters
>Deposition of surface layers by the LPCVD process conducted in a TiCl4-H2-N2atmosphere: contribution of the carbon contained in the steel substrate and of total pressure of the gaseous atmosphere
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Deposition of surface layers by the LPCVD process conducted in a TiCl4-H2-N2atmosphere: contribution of the carbon contained in the steel substrate and of total pressure of the gaseous atmosphere
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机译：Deposition of surface layers by the LPCVD process conducted in a TiCl4-H2-N2atmosphere: contribution of the carbon contained in the steel substrate and of total pressure of the gaseous atmosphere
