首页> 外文期刊>semiconductor science and technology >Saturation of the free-electron concentration in delta -doped GaAs: the DX centre in two dimensions
【24h】

Saturation of the free-electron concentration in delta -doped GaAs: the DX centre in two dimensions

机译:Saturation of the free-electron concentration in delta -doped GaAs: the DX centre in two dimensions

获取原文
       

摘要

The saturation of the free-electron concentration at high doping densities in delta -doped GaAs is studied by Shubnikov-de Haas measurements under hydrostatic pressure. Saturation occurs as soon as the depth of the Hartree potential is large enough to make the energy of the DX centre line up with the Fermi energy. The ultimate limit of the low-temperature equilibrium free-electron concentration in truly delta -doped GaAs is estimated to be 5.5*1012cm-2for Si donors. For realistic samples grown at Ts=500 degrees C the electron concentration is saturated at 7*1012cm-2due to the occupation of DX centres in a doping sheet, of finite thickness ( approximately=30 AA). For samples grown at higher temperatures (Ts=600 degrees C) autocompensation can occur prior to the population of the DX centre. Increases in mobility with increasing pressure observed in the Shubnikov-de Haas measurements for the i=0 sub-band provide additional evidence for a movement of the donors away from the original doping plane.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号