AuO+and AuO+2gaseous ions formed during the sputter deposition of Au films in Arhyphen;O2discharges

摘要

AuO+and AuO+2gaseous ions formed during the sputtering of an Au target in 1.0times;10minus;2Torr, rfhyphen;excited Arhyphen;O2discharges were studied by glowhyphen;discharge mass spectrometry. These ions are created from neutral species in the negative glow and are incident on the substrate during a sputter deposition. The relative flux of AuO+2/Au+, AuO+/Au+, and AuO+2/AuO+was determined for gas compositions from 100percnt; Ar to 100percnt; O2. The results show that the arrival of Auhyphen;oxide species at the substrate, in addition to Au atoms, must be taken into account when modeling the growth of Au films sputter deposited in O2hyphen;bearing discharges.