Reversal of UV Sensitivity and Loss Reduction of SiON Microring Resonator by Thermal Annealing

摘要

We developed a high temperature thermal annealing technique of high index SiON waveguide up to 1160 ℃ and the absorption loss in the wavelength range of 1510-1520 nm due to N-H radicals was successfully re-uced. In addition, we discovered the reversal of UV sensitivity of SiON film by thermal annealing, and successfully demonstrated the red-shift trimming of microring resonator with SiON core and the improvement of double series coupled microring resonator by selective UV trimming.