...
首页> 外文期刊>applied physics letters >Lighthyphen;induced defect creation in amorphous silicon: Single carrier versus excitonic mechanisms
【24h】

Lighthyphen;induced defect creation in amorphous silicon: Single carrier versus excitonic mechanisms

机译:Lighthyphen;induced defect creation in amorphous silicon: Single carrier versus excitonic mechanisms

获取原文
           

摘要

A quantitative explanation is derived for the lighthyphen;induced degradation of compensated amorphous silicon. The analysis suggests that donor levels in compensated hydrogenated amorphous silicon (ahyphen;Si:H) lead to an efficient spatial separation of trapped electrons and holes, thereby preventing excitonic tailhyphen;tohyphen;tail recombination thought to be responsible for metastable defect creation during illumination. This confirms the original defect creation model which has recently been challenged by single carrier mechanisms invoking dispersive hydrogen motion as the ratehyphen;limiting step.

著录项

  • 来源
    《applied physics letters》 |1990年第23期|2313-2315|共页
  • 作者

    Martin Stutzmann;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号