A Simple and Easily Controllable Plant for Rapid Cathodic and Reactive Sputtering

摘要

Integrated electronic circuits based on thin films have stimulated interest in techniques like cathodic sputtering, which offer many advantages over other methods of producing thin films. In order to start work on thin film micro-circuitry, a sputtering plant that can be used both for cathodic and reactive sputtering was designed and fabricated. The paper describes the basic principles of the technique and gives details of a laboratory sputtering plant designed and constructed for production of thin films.