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首页> 外文期刊>applied physics letters >PHONONhyphen;INDUCED STRUCTURES IN THE TUNNELING CHARACTERISTICS OFnhyphen;TYPE Sihyphen;OXIDEhyphen;METAL JUNCTIONS
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PHONONhyphen;INDUCED STRUCTURES IN THE TUNNELING CHARACTERISTICS OFnhyphen;TYPE Sihyphen;OXIDEhyphen;METAL JUNCTIONS

机译:PHONONhyphen;INDUCED STRUCTURES IN THE TUNNELING CHARACTERISTICS OFnhyphen;TYPE Sihyphen;OXIDEhyphen;METAL JUNCTIONS

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摘要

Fine structures in the tunneling characteristics ofnhyphen;type Sihyphen;oxidehyphen;metal junctions have been observed at biases approximately equal to the energy of peaks in the Si phonon distribution. We show that these structures cannot arise from phosphorus localhyphen;mode phonons. Instead, they reflect Si phonon peaks and can be attributed to emission of Si phonons by tunneling electrons.

著录项

  • 来源
    《applied physics letters》 |1971年第5期|200-202|共页
  • 作者

    D. C. Tsui; L. N. Dunkleberger;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
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