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RP and RQA Analysis for Floating Potential Fluctuations in a DC Magnetron Sputtering Plasma

机译:直流磁控溅射等离子体中浮动电位波动的RP和RQA分析

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摘要

The nonlinear dynamics of a direct current magnetron sputtering plasma is visualized using recurrence plot (RP) technique. RP comprises the recurrence quantification analysis (RQA) which is an efficient method to observe critical regime transitions in dynamics. Further, RQA provides insight information about the system's behavior. We observed the floating potential fluctuations of the plasma as a function of discharge voltage by using Langmuir probe. The system exhibits quasi-periodic-chaotic-quasi-periodic-chaotic transitions. These transitions are quantified from determinism, Lmax, and entropy of RQA. Statistical investigations like kurtosis and skewness also studied for these transitions which are in well agreement with RQA results.
机译:采用递归图(RP)技术可视化了直流磁控溅射等离子体的非线性动力学。RP 包括递归量化分析 (RQA),这是一种观察动力学中关键状态转变的有效方法。此外,RQA 提供有关系统行为的洞察信息。我们通过使用Langmuir探头观察了等离子体的浮动电位波动作为放电电压的函数。该系统表现出准周期-混沌-准周期-混沌转换。这些跃迁由RQA的确定性、Lmax和熵量化。峰度和偏度等统计研究也研究了这些与RQA结果非常吻合的转变。

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