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The effect of growth parameters on the intrinsic properties of large-area single layer graphene grown by chemical vapor deposition on Cu

机译:生长参数对化学气相沉积法生长的大面积单层石墨烯本征性能的影响

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摘要

We present a comprehensive study of the parameter space for single layer graphene growth by chemical vapor deposition on Cu. The temperature is the most widely recognized control parameter in single layer graphene growth. We show that the methane-to-hydrogen ratio and the growth pressure also are critical parameters that affect the structural perfection and the cleanliness of graphene. The optimal conditions for suppressing double and multilayer graphene growth occur near 1000 °C, 1:20 methane-to-hydrogen ratio, and a total pressure in the range from 0.5 to 1 Torr. Raman mapping of a 40 x 30 μm~2 area shows single layer domains with 5-10 μm linear dimensions. Atomic resolution imaging of suspended graphene by aberration corrected scanning transmission electron microscopy shows that the single layer graphene consists of areas of 10-15 nm linear dimensions and smaller patches of residual contamination that was undetected by other characterization methods.
机译:我们提出了通过化学气相沉积在Cu上生长单层石墨烯的参数空间的综合研究。温度是单层石墨烯生长中最广为人知的控制参数。研究表明,甲烷与氢的比和生长压力也是影响石墨烯结构完善度和清洁度的关键参数。抑制双层和多层石墨烯生长的最佳条件发生在 1000 °C 附近,甲烷与氢的比例为 1:20,总压力在 0.5 至 1 Torr 范围内。40 x 30 μm~2 面积的拉曼光谱显示了线性尺寸为 5-10 μm 的单层域。通过像差校正扫描透射电子显微镜对悬浮石墨烯进行原子分辨率成像表明,单层石墨烯由10-15 nm线性尺寸的区域和较小的残留污染斑块组成,这是其他表征方法无法检测到的。

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