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Controlled barrier height InP Schottky diodes prepared by sulfur diffusion

机译:Controlled barrier height InP Schottky diodes prepared by sulfur diffusion

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摘要

Schottky barrier diodes with adjusted effective barrier heights have been obtained by diffusing sulfur intonhyphen;type InP to form a shallow highly doped layer at the surface. The necessary geometry and doping conditions for achieving lowered barrier heights are described and the experimental procedure for the diffusion of sulfur in InP is outlined. Data are presented on several devices having different surface layer impurity concentrations and effective barrier heights.

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  • 来源
    《applied physics letters》 |1977年第4期|283-285|共页
  • 作者

    J. J. Coleman;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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