We have fabricated the first InAshyphen;channel fieldhyphen;effect transistor, which shows a transconductance of 180 mS/mm at 1 V drainhyphen;source bias (77 K). An improved buffer layer could significantly improve the device performance. In addition, we propose a new brokenhyphen;gap heterojunction fieldhyphen;effect transistor based on these materials that could provide an order of magnitude higher transconductance compared to existing device configurations based on AlGaAs/GaAs.
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