Azide photoresist for thermal-laser imaging

摘要

Two azide-type compounds for thermal-laser photoresists have beeninvestigated. One was an azide-pendant poly(vinyl ether) as a binderpolymer for positive imaging, and the other was a cyanine dye azidefor negative imaging. The positive photoresist, which was composed ofnigrosine as an infrared (IR)-absorbing dye and an azide-pendantpoly(vinyl ether), and the negative photo- resist, which was composedof a Novolak resin and a cyanine dye azide as an IR-absorbing dye,were exposed by scanning a light spot of 15 pm from a 780 nm, 30 mWlaser, giving sensitivities of 340 and 500 mJ/cm~2 for the positiveand the negative photoresist.