Development of reactive sputtering method assisted by inductively coupled discharge for high-pate deposition of magnesium oxide

摘要

For the purpose of high-rate deposition of high-quality magnesium oxide thin films that have been used as the protection-layers of discharge electrodes in plasma display panels, we propose a new reactive sputtering process in which conventional planar magnetron is assisted by the inductively coupled plasma. In this paper, the current status of the development of this facility is described. Experimental results on discharge properties, plasma parameters and optical emission properties are shown.