Fabrication zinc oxide thin films by reactive shielded vacuum arc ion plating

摘要

Zinc oxide thin films were prepared on a borosilicate glass substrate by a steered and shielded reactive vacuum arc deposition method. The cathode spot was driven on a cathode surface using weak and strong permanent magnets, placed behind the cathode. The arc was operated at DC 30 A and the in-process pressure was varied from 0.1 to 5.0 Pa. All films had a strong ZnO (200) peak, indicating c-axis orientation. Highly transparent films in visual region were obtained at 0.5 and 3.0 Pa with both weak and strong magnets. With the strong magnet, electric resistivity varied from 10{sup}(-3) to 15 Ω cm as the pressure increased. However; with the weak magnet, resistivity on the order of 10{sup}(-3) Ω cm order was obtained over a wide pressure range of 0.1 to 1.0 Pa.