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Atomistic simulation of dislocation emission in nanosized grain boundaries

机译:Atomistic simulation of dislocation emission in nanosized grain boundaries

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摘要

The present work deals with the atomic mechanism responsible for the emission of partial dislocations from grain boundaries (GB) in nanocrystalline metals. It is shown that, in a 12 nm grain-size sample, GBs containing grain-boundary dislocations (GBDs) can emit a partial dislocation during deformation by local atomic shuffling and stress-assisted free-volume migration. As in previous work, the nucleation occurs at a GBD, which, upon nucleation and propagation, is removed. In the present case, free-volume migration occurs away from the nucleation region both before and after the nucleation event.

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