...
首页> 外文期刊>applied physics letters >Efficient generation at 421 nm by resonantly enhanced doubling of GaAlAs laser diode array emission
【24h】

Efficient generation at 421 nm by resonantly enhanced doubling of GaAlAs laser diode array emission

机译:Efficient generation at 421 nm by resonantly enhanced doubling of GaAlAs laser diode array emission

获取原文
           

摘要

The 842hyphen;nm diffractionhyphen;limited emission from an injectionhyphen;locked laser diode array was frequency doubled using a monolithic sphericalhyphen;mirror KNbO3crystal cavity. Maximum unidirectional external 421 nm power of 24 mW was generated with 167 mW of pump power. Maximum total internal secondhyphen;harmonic power and conversion efficiency of 64 mW and 45percnt; were obtained. Effects of heating in the crystal are described.

著录项

  • 来源
    《applied physics letters》 |1989年第3期|218-220|共页
  • 作者

    Lew Goldberg; Myung K. Chun;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号