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Stresshyphen;corrosion cracking in silicon

机译:Stresshyphen;corrosion cracking in silicon

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摘要

Stresshyphen;corrosion crackingmdash;the phenomonon in which the initiation and propagation of cracks is enhanced by a chemically active environmentmdash;has previously not been observed in silicon. For example, extensive experiments have shown no effect of water on the fracture properties. However, using indentation cracks in the presence of a HF etch, we have been able to show stresshyphen;corrosion cracking in silicon for the first time. This is attributed to the initial removal of the native silica layer, and the subsequent lowering of the fracture resistance by passivation of the crack surfaces.

著录项

  • 来源
    《applied physics letters》 |1990年第20期|1962-1964|共页
  • 作者

    M. D. Thouless; R. F. Cook;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

  • 入库时间 2024-01-25 19:53:52
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