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Soft-threshold lucky drift theory of impact ionisation in semiconductors

机译:Soft-threshold lucky drift theory of impact ionisation in semiconductors

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摘要

Arguments are presented for the existence of a soft threshold to impact ionisation in GaAs and other related semiconductors. A soft-threshold factor is introduced into the theory of lucky drift and the results are applied to some major semiconductors. Excellent fit of theory to experiment is obtained, which confirms that the thresholds are indeed soft. Soft-threshold factors and new mean free paths are obtained for Ge, Si, GaAs, InP and GaP. The mean free paths are shown to obey a simple law. The results for GaAs are applied to the case of multilayer APD. It is shown that excellent agreement with the results of Capasso et al. (1982) are obtained, even with a 60:40 division of band edge discontinuity.

著录项

  • 来源
    《semiconductor science and technology》 |1987年第2期|116-122|共页
  • 作者

    B K Ridley;

  • 作者单位

    Dept. of Phys., Essex Univ., Colchester, UK;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

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