首页> 外文期刊>nanotechnology >Determination of near-surface forces in optical polishing using atomic force microscopy
【24h】

Determination of near-surface forces in optical polishing using atomic force microscopy

机译:使用原子力显微镜测定光学抛光中的近表面力

获取原文
获取外文期刊封面目录资料

摘要

An atomic force microscope was used to measure near-surface forces between individual metal-oxide polishing agent particles and planar optical glass surfaces immersed in aqueous fluids of carefully controlled chemistry. For a given polishing agent, the fluid pH was found to significantly influence the magnitude of the near-surface forces. Generally, if the fluid pH equals the isoelectric point of the polishing agent, then the attractive force between the polishing agent particle and the glass surface is maximized. The pH-driven modulation of near-surface forces was found to be completely reversible, indicating the need to control surface charge during aqueous polishing of optical glass through manipulation of the slurry chemistry.
机译:原子力显微镜用于测量单个金属氧化物抛光剂颗粒与浸入精心控制的化学水溶液中的平面光学玻璃表面之间的近表面力。对于给定的抛光剂,发现流体pH值对近表面力的大小有显著影响。通常,如果流体pH值等于抛光剂的等电点,则抛光剂颗粒与玻璃表面之间的吸引力最大。发现近表面力的pH驱动调制是完全可逆的,这表明在光学玻璃的水性抛光过程中需要通过操纵浆料化学来控制表面电荷。

著录项

  • 来源
    《nanotechnology》 |1994年第2期|70-79|共页
  • 作者

    M J Cumbo; S D Jacobs;

  • 作者单位

    Lab. for Laser Energetics, Rochester Univ., NY, USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 英语
  • 中图分类
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号