SiO2 thick films were quickly deposited on silicon wafers by flame hydrolysis deposition (FHD) method, followed by consolidation in electric resistance furnace at 1380degreesC. The as-deposited films were confirmed to be vitreous silica by means of SEM and X-ray diffraction (XRD). The thickness of the films is up to 37 mum, and the deposition speed is as high as 8 mum min(-1). The refractive index and absorbing loss (extinction coefficient) are also measured by spectroscopic ellipsometer. (C) 2003 Elsevier B.V. All rights reserved. References: 10
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