Controlling Germanium Oxidation: With a Vacuum Substrate Carrier

摘要

Queue time is unavoidable for sub-65 nm technology development. It is caused by a lack of equipment, transrer Detween semiconductor tools or transfer to and from remote sites. Molecular contamination has the potential to cause damage equivalent to today's particle contamination. Furthermore, outgassing from a wafer or substrate carrier box will be extremely critical for neighboring wafers.