We present a percolation study of two-dimensional crossbar networks and investigate their defect tolerance to missing crossbars. We find that the rate at which connectivity degrades in such circuits is nearly constant up to a missing-crossbar fraction f of about 50, for both site and bond percolation. On the other hand, for f > 0.5 the rate of defect tolerance decreases very rapidly. This study provides a measure of the degree of reliability of crossbar networks presently envisioned for nanoelectronics, suggesting that this type of architecture is quite robust with respect to defect concentration. (C) 2002 Elsevier Science Ltd. All rights reserved. References: 20
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