Stacking Defects in C60Films

摘要

The structure of pollycrystalline C60films prepared by sublimation from 99.9 pure C60powder and from graphite soot was investigated by X-ray diffraction. A complex fcc (111) line was found in the former samples. Comparison of experimental and simulated (111) profiles allowed to assess quantitatively the degree of stacking disorder introduced during the growth of the film. Probabilities could be derived for continuation of already started fcc and hep sequences, thereby characterizing the statistical microstructure of the C60films. Also, the relative magnitudes of inter- and intra-layer disorder can be estimated. The films deposited from graphite soot show a high structural disorder.