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Optical instrumentation for microelectronics

机译:微电子光学仪器

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This article is devoted to the work of the Design Office of Precision Electronic Machine- Construction (KBTEM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 μm to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 μm to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.
机译:本文专门介绍精密电子机械制造设计办公室 (KBTEM OMO) 的工作,该办公室五十多年来一直为光机设备提供微电子技术。通过使用该设备,集成电路元件的尺寸减小了 30 倍(从 5 μm 到 180 nm),它们在晶圆整个区域上的排列精度提高了 200 倍(从 2 μm 到 10 nm)。第一个具有数十个晶体管的集成电路已经蜕变为具有数十亿个晶体管的复杂功能系统。

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