A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Sihyphen;YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser directhyphen;write etching. Multilayered YBaCuO thin films were then deposited byehyphen;beam evaporation and annealed in a rapid thermal annealing system for 30ndash;90 s at 980thinsp;deg;C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Sihyphen;YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10hyphen;mgr;mhyphen;wide, 1hyphen;mmhyphen;long and 2.5hyphen;mgr;mhyphen;wide, 80hyphen;mgr;mhyphen;long lines, theTcwas observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2at 75 K. This patterning technique may be useful for fabrication of highTcsuperconducting interconnects and devices.
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