Fabrication of Thin Film Resistors and Resistor Networks by a Selective Etching Process

摘要

Results on the selective etching of a two layer system (resistive layer and conductive layer) on glass substrates to achieve resistors/resistor-networks have been described. This method is compared with the earlier used methods. The method reported in the paper results in good resolution of thin film patterns, smaller area flexibility, higher yield and lower cost.