Influence of substrate material and ion bombardment on plasma‐deposited fluorocarbon thin films

摘要

AbstractThe influence of substrate material and ion bombardment on fluorocarbon thin films deposited using a C2F6glow discharge in an rf, parallel plate reactor was investigated. Monitoring of the plasma process by optical emission spectroscopy indicated that the dominant species in the glow discharge was CF2. Studies of bulk polytetrafluoroethylene (PTFE) and plasma‐polymerized fluorocarbon thin‐film samples in an XPS system demonstrated that the formation of non‐CF2species can be induced by ion bombardment of CF2molecules. Characterization of the deposited fluorocarbon films by XPS found that the F/C ratio and CFxdistribution (0