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Photoinduced diffusion of Ag in GexSe1minus;xglass

机译:Photoinduced diffusion of Ag in GexSe1minus;xglass

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摘要

Diffusion of Ag in GexSe1minus;x(xsim;0.1) under UV light irradiation is studied using Rutherford backscattering spectrometry and microlithography techniques. The diffusion coefficient at 21thinsp;deg;C and 2 mW/cm2is determined to be 2.7 nm2/s. The temperature dependence of the diffusivity follows an Arrheniushyphen;type equation with an activation energy of 5.32 kcal/mole (0.23 eV) and a prehyphen;exponent factor of 2.5times;104nm2/s. The reciprocity of irradiation intensity and exposure time with respect to the diffusion distance is confirmed. Specifically, the diffusivity is found to be directly proportional to the irradiation intensity.

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  • 来源
    《applied physics letters》 |1985年第6期|543-545|共页
  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 英语
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