...
首页> 外文期刊>電子情報通信学会技術研究報告. シリコン材料·デバイス. Silicon Devices and Materials >Very low power system LSI toward 0.1V operation - issues and solutions for low power circuit techniques
【24h】

Very low power system LSI toward 0.1V operation - issues and solutions for low power circuit techniques

机译:Very low power system LSI toward 0.1V operation - issues and solutions for low power circuit techniques

获取原文
获取原文并翻译 | 示例
           

摘要

Leakage current is growing remarkably in sub-100nm era and it will prevent system LSIs to suppress the power dissipation. Such leakage current includes the sub-threshold leak and the gate-tunneling leak of MOS transistors. The leakage current will dominate the system LSIs' performance in the near future. Several low-power techniques are evaluated and issues are discussed from the view point of leakage reduction. The LSI design must become complicated when intellectual properties (IPs) are re-used for a highly functional and integrated system-in-a-package chip. Then the low-power techniques are required to be simple, unified and generalized. The power switch system corresponding to the IP design is suggested as a generalized technology. The simultaneous supply-voltage and body-bias control is discussed as a technology integration.
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号