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1/f noise due to the return statistics of mobile point defects in extrinsic semiconductor materials

机译:由于外在半导体材料中移动点缺陷的返回统计导致的 1/f 噪声

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摘要

We investigate fixed dopants in the presence of mobile point defects like foreign atoms or vacancies. A mobile defect entering the first Bohr radius R-B of a dopant will modulate the generation-recombination process. The times a defect walks inside or outside R-B are shown to be power-law distributed giving rise to 1/f(b) noise. The predicted Hooge coefficient alpha(def) depends on R-B, on the normalized fluctuations of charge carriers and on the number of charge carriers compared to lattice sites; our model suggests that the magnitude of 1/f noise can be decreased at will by increasing the ionization of dopants.
机译:我们研究了存在移动点缺陷(如外来原子或空位)的固定掺杂剂。进入掺杂剂的第一个玻尔半径R-B的移动缺陷将调节生成-重组过程。缺陷在R-B内部或外部行走的次数被证明是幂律分布的,从而产生1/f(b)噪声。预测的 Hooge 系数 alpha(def) 取决于 R-B、电荷载流子的归一化波动以及与晶格位点相比的电荷载流子数量;我们的模型表明,通过增加掺杂剂的电离,可以随意降低1/f噪声的大小。

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